Al2O3- Sapphire Wafer, C-plane (0001), 3" Dia.x0.5mm , 2SP

Al2O3- Sapphire Wafer, C-plane (0001), 3" Dia.x0.5mm , 2SPFeatures: Sapphire (single crystal of Al2O3 ) is being used extensively as a substrate for III V nitrides and for many other epitaxial films Orientation: C axis[0001]( + 0. 3 Deg) with Standard Flat Diameter: 3" + 0. 3mm Thickness: 500um + 25 um Major Flat: A axis[11 20]+ 0. 2o Surface Finish: Front sides: Epi polished Ra<0. 5nm (by AFM) Back side: Epi polished , <0. 5nm(by AFM) TTV: < 10um Polished surface: Two side epi polished by special CMP

CE certificated only

Operation in potentially explosive areas

Thickness:         12 um

equipment MSK-140 and MSK-115A (Updated from VS-300) Solvent Retention Less than 5mg/m2 Appearance Within the sample of the limit Slip Factor CPP/CPP   less than 1

28mm in Nickel Tab with Adhesive Polymer Tape (9

Tube and fitting are included to connect with syringe and slot die heads

110 - 240V AC (50/60Hz) power adapter

Automatic Film Coater with 12"W x 24"L Glass Bed and 250mm Adjustable Doctor Blade - MSK-AFA-II

Oxygen free copper gasket for high vacuum sealing of OTF-1200X-HVHP-80

995 alumina tube proves inert to carbon and refractory metals in many severe situations:

The mortar is octagonal and the pestle is cylindrical with 3/4" in diameter and 3 7/8" in length

The wafer container is packed in 1000 class clean room and plastic bag (20 containers per bag)