Al2O3 - Sapphire Wafer, M plane, 5x5x0.5mm, 2 SP - ALM050505S2

Al2O3 - Sapphire Wafer, M plane, 5x5x0.5mm, 2 SP - ALM050505S2Fearures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 5 mm x 5 mm x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. M plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with Ra < 5 A 2 sides polished Package: Each wafer is packed in 1000 class clean room with

5mm(D) x 5mm(H)

grinding time and speed

polished grinding surfaces

Each channel can work under different modes and functions independently

APS:             20 nm

Polished surface: One side epi polished by special CMP technology

7 x 10-8 Ohm-metre

Bulk density:  0

Surface Finish: Two sides polished

2'' (Outside Diameter * Inner Diameter)

Material: Copper Foam

TDD:             <1E8 cm^2