Al2O3 - Sapphire Wafer 5x5x0.5 mm, A plane (11-20), 2 SP

Al2O3 - Sapphire Wafer 5x5x0.5 mm, A plane (11-20), 2 SPFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties Wafer size: 5 mm x 5 mm x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. A plane orientation Polished surface: Two sides EPI polished via a special CMP procedure with Ra < 5 A Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with

Please don't apply too much force during cutting

L=L1+L2:=160+110=270mm

Coating width: 80 mm

Pressing die installation schematic

5 +/- 1 mm) Tube Length 1200 mm  Detailed dimension drawing Max

Particle Size:    50-100 mesh

Do not operate under vacuum

Please use a fabric cloth to wipe out the residues that remain in the bow/base

Ball mill and sieve the powder and apply only the 32~75 mircrons powder to the pressing die to avoid the damages

This eight channels computerized temperature measurement / monitoring device is designed for recording  all  furnaces operation by one computer in laboratory

Orientation: C-axis[0001]( +/-0

Part Number DF-0403 Blade Diameter 100 mm  +/ -0